Ultra-Pure Water (UPW)

Process Flow Diagram

Technical Reserve

Based on membrane separation processes (ultrafiltration, primary/secondary reverse osmosis (RO), primary electrodeionization (EDI), secondary EDI) and AI-based dynamic monitoring technology, a full-process water quality optimization system is constructed to ensure the produced water resistivity is stabilized at 18.2 MΩ·cm, catering to the requirements of semiconductor wafer cleaning and high-precision manufacturing.

1、Long-term Anti-fouling Membrane Technology: Nano-coated RO membranes (primary/secondary) extend chemical cleaning cycles to 6-12 months with salt rejection efficiency ≥99%.

2、Dynamic Water Quality Optimization Algorithm: AI performs real-time analysis of ionic residues (including trace ions post-EDI) and particulate concentration, achieving a membrane fouling early warning rate ≥90%.

3、Flexible Process Adaptation Capability: Modular design enables rapid adjustment of pretreatment (e.g., ultrafiltration) and polishing processes (secondary EDI deep desalination) to adapt to complex water quality fluctuations.

Industrialization Advantages

Through modular integration and in-house manufacturing capabilities, achieve efficient delivery and full-life cycle cost optimization.

1、In-house Manufacturing of Core Components: Storage tanks with PTFE lining achieve 20% extended service life and significantly reduced processing costs.

2、Prefabricated Integrated Delivery: Ultrafiltration-reverse osmosis (primary/secondary RO) integrated skid-mounted modular deployment effectively reduces floor space.

3、Automated Control Platform: SCADA system optimizes energy consumption and maintenance strategies in real time, leading to substantial full-cycle cost reduction.